FIS4-Ultraviolet
Four-wave Interferometric Sensor
Near ultraviolet spectrum (200nm~450nm)
Super high resolution of 262144 phase points
Absolute accuracy up to 10nmRMS
The ultra-high resolution of 512×512 (262144) phase points enables high-precision wavefront measurement from 200nm to 450nm band, which can be used for optical system aberration measurement, optical system calibration, planar (wafer) surface shape measurement, optical spherical surface shape measurement, etc.
FIS4 UV combines the patented technology of random coding four-wave diffraction with the ultraviolet camera to interfere at the position of the rear image plane, which requires low coherence of the light source and does not require phase shifting. With the ultraviolet imaging system, the wave front real-time measurement can be achieved, with ultra-high vibration resistance and ultra-high stability, and NM-level precision measurement can be achieved without vibration isolation.
◆ Single light interference, no reference light
◆ UV spectrum 200nm~450nm band
◆ 2nm RMS high phase resolution
◆ Strong vibration resistance, no optical vibration isolation
◆ Like imaging, simple and fast light path construction
◆ Support collimated beam, high NA non-collimated beam
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Wavelength range |
200nm~450nm |
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Target size |
9mm×9mm |
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Spatial resolution |
26μm |
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Sampling resolution |
512×512(262144pixel) |
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Phase resolution |
<2nmRMS |
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Absolute accuracy |
10nmRMS |
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Dynamic range |
80μm(256λ) |
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Sampling rate |
32fps |
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Real-time processing speed |
10Hz(Full resolution) |
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Interface type |
USB3.0 |
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dimension |
70mm×46.5mm×68.5mm |
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weight |
about 240g |
